[Other] Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

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mdyekrarahman Post time 2024-4-28 03:43:30 | Show all posts |Read mode
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journal:Journal of Vacuum Science & Technology A

Authors:Azmain A. Hossain; Haozhe Wang; David S. Catherall; Martin Leung; Harm C. M. Knoops; James R. Renzas; Austin J. Minnich

Published date:2023-12-1

DOI:10.1116/6.0002965

PDF link:https://pubs.aip.org/avs/jva/art ... 601_1_6.0002965.pdf

Article link:http://dx.doi.org/10.1116/6.0002965

Article Source:American Vacuum Society


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