[Elsevier] Effects of interfacial oxide layer formed by annealing process on WORM characteristics of Ag/CuxO/SiOx/n+每Si devices

StacyA Post time 2024-4-16 14:38:20 | Show all posts |Read mode
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journalㄩJournal of Alloys and Compounds

AuthorsㄩChih-Chieh Hsu; Sheng-Yen Hua; Xuan-Zhi Zhang; Wun-Ciang Jhang; Chao-Wen Cheng; Jung-En Tsai; Yi-Ming Wu; Yu-Sheng Chien; Wen-Chin Wu

Published dateㄩ2022-3-

DOIㄩ10.1016/j.jallcom.2021.162918

PDF linkㄩhttps://www.sciencedirect.com/sc ... 925838821043280/pdf

Article linkㄩhttp://dx.doi.org/10.1016/j.jallcom.2021.162918

Article SourceㄩElsevier BV


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Victor90 Post time 2024-4-16 14:38:21 | Show all posts

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