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[IOP] Mist chemical vapor deposition of crystalline MoS<sub>2</sub> atomic layer films using sequential mist supply mode and its application in field-effect transistors

t2hr5k3 Post time 2022-8-12 15:24:52 | Show all posts |Read mode
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journal£ºNanotechnology

Authors£ºAbdul Kuddus; Arifuzzaman Rajib; Kojun Yokoyama; Tomohiro Shida; Keiji Ueno; Hajime Shirai

Published date£º2022-1-22

DOI£º10.1088/1361-6528/ac30f4

Article link£ºhttp://dx.doi.org/10.1088/1361-6528/ac30f4

Article Source£ºIOP Publishing¡£


Remark£º

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George Junior Member
2022-8-12
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