[Elsevier] Exploring non-stoichiometric SiOx thin film for non-volatile memory application

Arisenla Post time 2024-5-6 17:28:06 | Show all posts |Read mode
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journal£ºJournal of Alloys and Compounds

Authors£ºRubila Laishram; Mir Waqas Alam; Basma Souayeh; Naorem Khelchand Singh

Published date£º2024-3-

DOI£º10.1016/j.jallcom.2024.173420

PDF link£ºhttps://www.sciencedirect.com/sc ... 925838824000069/pdf

Article link£ºhttp://dx.doi.org/10.1016/j.jallcom.2024.173420

Article Source£ºElsevier BV¡£


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cbaytar Post time 2024-5-6 17:28:07 | Show all posts

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