Comprehensive search ChatGPT Online Scientific research tools
Sign in Sign Up

Science hub Mutual Aid community


[Elsevier] Low-energy oxygen ion beam induced chemical vapor deposition using methylsilane or dimethylsilane for the formation of silicon dioxide films

1966008854 Post time 2024-4-29 13:11:02 | Show all posts |Read mode
Reward20points

journal£ºThin Solid Films

Authors£ºSatoru Yoshimura; Satoshi Sugimoto; Takae Takeuchi; Masato Kiuchi

Published date£º2022-10-

DOI£º10.1016/j.tsf.2022.139508

PDF link£ºhttps://www.sciencedirect.com/sc ... 040609022004163/pdf

Article link£ºhttp://dx.doi.org/10.1016/j.tsf.2022.139508

Article Source£ºElsevier BV¡£

Remark£º

Best Answer

Super16 Senior Member
2024-4-29
Please adopt

View Full Content

You can support us by donating, we would be very grateful.
Reply

Use magic Donate Report

All Reply1 Show all posts
Super16 Post time 2024-4-29 13:11:03 | Show all posts

This post has been completed

Completed attachments will be deleted within 24 hours.
You can support us by donating, we would be very grateful.
Reply

Use magic Donate Report

1966008854 Lv.4
Senior Member

  • post

  • reply

  • points

    2985

Same Category

Latest Reply

Announcement

Enthusiastic users today


Return to the list