Terahertz dielectric properties of Fe3O4 thin films deposited on Si (100) substrate

Post time 2024-4-17 09:08:25

journal：Semiconductor Science and Technology

Authors：Ashish Khandelwal; L S Sharath Chandra; Shilpam Sharma; Archna Sagdeo; R J Choudhary; M K Chattopadhyay

Published date：2024-2-1

DOI：10.1088/1361-6641/ad1cca

PDF link：https://iopscience.iop.org/article/10.1088/1361-6641/ad1cca

Article link：http://dx.doi.org/10.1088/1361-6641/ad1cca

Article Source：IOP Publishing。

Remark：

Post time 2024-4-17 09:08:26

: This post has been completed
Completed attachments will be deleted within 24 hours.

[IOP] Terahertz dielectric properties of Fe3O4 thin films deposited on Si (100) substrate

Best Answer

Same Category

Latest Reply

Announcement

Enthusiastic users today

[IOP] Terahertz dielectric properties of Fe3O4 thin films deposited on Si (100) substrate Copy

Best Answer

Same Category

Latest Reply

Announcement

Enthusiastic users today

[IOP] Terahertz dielectric properties of Fe3O4 thin films deposited on Si (100) substrate