[SPIE] High NA EUV scanner: obscuration and wavefront description

compositionjupi Post time 2022-1-24 03:42:46 | Show all posts |Read mode
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journal£ºExtreme Ultraviolet Lithography 2020

Authors£ºLaurens de Winter; Timur Tudorovskiy; Jan van Schoot; Kars Troost; Erwin Stinstra; Stephen Hsu; Toralf Gruner; Juergen Mueller; Ruediger Mack; Bartosz Bilski; Joerg Zimmermann; Paul Graeupner

Published date£º2020-11-18

DOI£º10.1117/12.2572878

Article link£ºhttp://dx.doi.org/10.1117/12.2572878

Article Source£ºSPIE¡£


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