DOI:https://doi.org/10.1021/acsaelm.1c00672
Article link:Impact of La Concentration on Ferroelectricity of La-Doped HfO2 Epitaxial Thin Films | ACS Applied Electronic Materials
Article author:[size=0.875]Tingfeng Song- [size=0.75][size=0.8125]Tingfeng Song
Institut de Ci¨¨ncia de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra, 08193 Barcelona, Spain
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, - Huan Tan
, - Romain Bachelet
, - Guillaume Saint-Girons
, - Ignasi Fina*
, and - Florencio S¨ĸnchez*
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